Discuss your materials, surface, and process R&D at AVS72
From November 8 to 13, Dr. Fedor Goumans will represent SCM at the AVS 72nd International Symposium & Exhibition in Pittsburgh.
Researchers interested in using atomistic and multi-scale simulations to accelerate materials, surface, interface, and process R&D can meet Fedor at the exhibition or email us to schedule a time.
Fedor would love to discuss how the Amsterdam Modeling Suite can help you model atomic-scale processing, thin films, plasma-surface chemistry, surface reactions, and materials interfaces. We are also happy to talk about related application areas including microelectronics, 2D materials, quantum materials, biomaterials, battery interfaces, and polymer chemistry & properties.
Meet Us in Pittsburgh
📍 Event: AVS72
📅 Date: 8–13 November 2026
📌 Location: David L. Lawrence Convention Center, Pittsburgh
🏢 Exhibition: Booth 603 — 10 November, 10:00 AM–5:00 PM; 11 November, 10:00 AM–4:30 PM; 12 November, 10:00 AM–2:30 PM
🎤 Talk: Atomistic Modeling of Atomic Layer Etching and Deposition: HF/SiO₂ ALE and TMA/Al₂O₃ ALD — Tuesday, 10 November, 3:15–3:30 PM, Room 316, session AP1+EL+MS+PS+TF-TuA: Advanced Atomic Scale Processing through Modeling and Simulation
📍 Poster: Reactive Atomistic Simulation Workflows for Thin-Film Growth and Surface Modification in ALD and ALE — Thursday, 12 November, 4:30–7:00 PM, Ballroom A, TF-ThP: Thin Film Poster Session
We look forward to connecting with researchers and partners to help accelerate materials, interfaces, and process R&D!
