Discuss your atomic layer process R&D at ALD/ALE 2026
From 28 June to July 1st, Dr. Fedor Goumans will represent SCM at the AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026).
Researchers interested in using atomistic and multi-scale simulations to accelerate their atomic layer process R&D can come to the SCM booth during the exhibition, check out Fedor’s poster on machine-learning accelerated modeling of atomistic ALE processes on Monday, his talk on fast reaction discovery for ALD chemistry on Wednesday, or email us to meet any other time.
Fedor would love to discuss how we can help you simulate atomic layer deposition and atomic layer etching processes to help you design better semiconductor materials and processes.
We are also happy to talk about your polymer chemistry & properties!
Meet Us in Tampa
📍 Event: ALD2026
📅Date: 28 June – 1 July 2026
📌 Location: Town & Country Resort, San Diego
🏢 Exhibition: 28 June 6-8pm; 29+30 June: 10am-7pm; 1 July: 10am-1.30pm
📍 Poster: 29 June, 5.45pm-7pm, Tampa Bay Salons 5-9 – Session ALE-MoP Atomic Layer Etching Poster Session, ALE-MoP-2 Active-Learning Accelerated Atomistic Modeling of ALE Processes,
📍 Talk: 1 July, 3pm, Room HB Plant Ballroom, AF1-WeA-7 Active-Learning PES Exploration: Fast Reaction Discovery in ALD Chemistry
We look forward to connecting with researchers and partners to help accelerate semiconductor R&D!
