New tutorial: Chemical Vapor Deposition / Atomic Layer Deposition with ReaxFF

Gain inside into the modeling concepts behind a fully atomistic simulation of chemical vapor deposition. A new step-by-step ReaxFF tutorial shows how acceleration methods combine with the molecule gun/sink to simulate chemical vapor / atomic layer deposition. The concepts discussed in the tutorial are in principle applicable to surface-atmosphere interactions, such as physical vapor deposition (PVD), solid-gas phase heterogeneous catalysis or plasma-surface reactions.